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Semiconductor AMC  Monitoring

Real-time, Mobile Measurements of NH₃, HF, & HCl in the FAB Environment


The Revolution in  FAB AMC Monitoring Explained

Contaminants in the FAB

Ammonia (NH₃), Hydrogen Fluoride (HF), and Hydrogen Chloride (HCl) are gases commonly present in trace amounts within the Semi FAB environment. Those trace amounts can adversely impact the product quality and diminish yields; they also represent an occupational health hazard. Our high-performance FOUP-borne IoT analyzers will continuously detect & quantify the Airborne Molecular Contamination (AMC) levels of the a/m gases in real-time, while on-the-move in the OHT to maximize the wafer yield & boost the FAB QA/QC.

FAB QA/QC Made Simple.

Our next-gen mobile AMC monitoring analyzers in real-time, with high-precision measurements ensure that the FAB environment is always at its best.



Our FAB AMC Optical Analyzer Features:

  • ICOS / CEAS Open-Path technology

  • Mobile AMC Detection

  • No carry-over or response time delay

  • Measurement range of 1ppb- few ppm

  • High-Precision: order of ppb (1σ, 1s)

  • Fast 1Hz data rate

  • Ultra-light weight

  • Touch screen display

  • Built-in WiFi

  • Battery-powered

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Let us know about your needs and we will assist you. 

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