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Semiconductor AMC Monitoring
Real-time, Mobile Measurements of NH₃, HF, & HCl in the FAB Environment
The Revolution in FAB AMC Monitoring Explained
Contaminants in the FAB
Ammonia (NH₃), Hydrogen Fluoride (HF), and Hydrogen Chloride (HCl) are gases commonly present in trace amounts within the Semi FAB environment. Those trace amounts can adversely impact the product quality and diminish yields; they also represent an occupational health hazard. Our high-performance FOUP-borne IoT analyzers will continuously detect & quantify the Airborne Molecular Contamination (AMC) levels of the a/m gases in real-time, while on-the-move in the OHT to maximize the wafer yield & boost the FAB QA/QC.
FAB QA/QC Made Simple.
Our next-gen mobile AMC monitoring analyzers in real-time, with high-precision measurements ensure that the FAB environment is always at its best.
Our FAB AMC Optical Analyzer Features:
ICOS / CEAS Open-Path technology
Mobile AMC Detection
No carry-over or response time delay
Measurement range of 1ppb- few ppm
High-Precision: order of ppb (1σ, 1s)
Fast 1Hz data rate
Touch screen display
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